Fabrication and structural properties of AlN submicron periodic lateral polar structures and waveguides for UV-C applications
Creators
- 1. Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstr. 36, 10623 Berlin (Germany)
- 2. Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States)
- 3. Adroit Materials, Inc., 2054 Kildaire Farm Rd., Suite 205, Cary, North Carolina 27518 (United States)
- 4. Faculty of Mathematics and Physics, University of Ljubljana, Jadranska 19, 1000 Ljubljana (Slovenia)
- 5. Department of Mechanical and Aerospace Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States)
Description
Periodically poled AlN thin films with submicron domain widths were fabricated for nonlinear applications in the UV-VIS region. A procedure utilizing metalorganic chemical vapor deposition growth of AlN in combination with laser interference lithography was developed for making a nanoscale lateral polarity structure (LPS) with domain size down to 600 nm. The Al-polar and N-polar domains were identified by wet etching the periodic LPS in a potassium hydroxide solution and subsequent scanning electron microscopy (SEM) characterization. Fully coalesced and well-defined vertical interfaces between the adjacent domains were established by cross-sectional SEM. AlN LPSs were mechanically polished and surface roughness with a root mean square value of ∼10 nm over a 90 μm × 90 μm area was achieved. 3.8 μm wide and 650 nm thick AlN LPS waveguides were fabricated. The achieved domain sizes, surface roughness, and waveguides are suitable for second harmonic generation in the UVC spectrum.
Additional details
Identifiers
- DOI
- 10.1063/1.4955033;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 108
- Journal Issue
- 26
- Journal Page Range
- vp.
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48035167
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- ALUMINIUM NITRIDES; CHEMICAL VAPOR DEPOSITION; ELECTRON SCANNING; ETCHING; FABRICATION; HARMONIC GENERATION; INTERFACES; INTERFERENCE; LASERS; NANOSTRUCTURES; PERIODICITY; POTASSIUM HYDROXIDES; SCANNING ELECTRON MICROSCOPY; SURFACES; THIN FILMS; WAVEGUIDES
- Descriptors DEC
- ALKALI METAL COMPOUNDS; ALUMINIUM COMPOUNDS; CHEMICAL COATING; DEPOSITION; ELECTRON MICROSCOPY; FILMS; FREQUENCY MIXING; HYDROGEN COMPOUNDS; HYDROXIDES; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; OXYGEN COMPOUNDS; PNICTIDES; POTASSIUM COMPOUNDS; SURFACE COATING; SURFACE FINISHING; VARIATIONS
Optional Information
- Notes
- (c) 2016 Author(s)