Published December 12, 2012 | Version v1
Journal article

Free-electron absorption in n-doped GaN semiconductors at mid-IR wavelengths in the strong phonon-plasmon coupling regime

  • 1. Kotel'nikov Institute of Radioengineering and Electronics of Russian Academy of Sciences, Vvedensky square 1,R-141120 Fryazino (Moscow Region) (Russian Federation)
  • 2. Laboratory of Micro- and PhotonElectronics, Department of Electronics and Informatics, Vrije Universiteit Brussel, Pleinlaan 2, 1050-Brussels (Belgium)

Description

We have calculated the free-carrier absorption coefficient for polar III-V semiconductors with strong LO phonon-plasmon interaction. We took several mechanisms into account, which assist in the photon absorption process. At the considered doping concentrations the most important scattering mechanisms are thermal LO phonon branch scattering, impurity scattering, plasmon branch scattering and acoustic phonon scattering. For all these interaction potentials screening by conduction electrons has been included. Computations are performed for β-GaN and α-GaN doped semiconductors at different mid-IR wavelengths and doping concentrations. For all considered cases the relative difference between the Drude model calculation results based on static and dynamic damping factors is typically smaller than 25-30%.

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/45/49/495103

Additional details

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
45
Journal Issue
49
Journal Page Range
[11 p.]
ISSN
0022-3727
CODEN
JPAPBE

INIS