Published February 1, 2006 | Version v1
Journal article

Crystal chemistry and electrical properties of the delafossite structure

  • 1. Materials Science and Engineering Department, Iowa State University, 2220 Hoover Hall Ames, IA 50011 (United States)

Description

Over the past few decades, the field of transparent conducting oxides has undergone tremendous advances. With the rapid growth of optoelectronic applications related to display technologies, traditional materials such as Sn-doped indium oxide (ITO) are now widely used as transparent electrodes. In addition, with the advent of p-type transparent conductors, through the transparent pn-junction building block, a wide range of functional transparent optoelectronic devices have been demonstrated including UV-emitting diodes, UV-detectors, and transparent thin film transistors. This paper will highlight the unique characteristics of oxide materials based on the delafossite structure with a focus on the interrelationship between the chemistry, crystal structure, process conditions, and electrical and optical properties. The delafossite structure (ABO2) is characterized by a layer of linearly coordinated A cations stacked between edge-shared octahedral layers (BO6). The A-site cation is comprised of Pt, Pd, Ag, or Cu ions nominally in a monovalent state. The B-site cation can consist of most trivalent transition metals, group III elements, rare earths, or charge compensated pairs (e.g. B2+/B4+). This layered structure leads to highly anisotropic physical properties. The crystal chemistry of the delafossite structure will be discussed in reference to phase stability, the stability of dopants, and the important physical properties such as the conductivity and optical transparency

Additional details

Identifiers

DOI
10.1016/j.tsf.2005.08.316;
PII
S0040-6090(05)01503-8;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
496
Journal Issue
1
Journal Page Range
p. 146-156
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
4. international symposium on transparent oxide thin films for electronics and optics
Acronym
TOEO-4
Dates
7-8 Apr 2005
Place
Tokyo (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37109840
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
COPPER IONS; CRYSTAL DOPING; CRYSTAL STRUCTURE; CRYSTALS; DOPED MATERIALS; ELECTRICAL PROPERTIES; INDIUM OXIDES; LAYERS; OPACITY; PALLADIUM IONS; PHASE STABILITY; PLATINUM IONS; RARE EARTH COMPOUNDS; SILVER IONS; THIN FILMS; TIN COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Descriptors DEC
CHALCOGENIDES; CHARGED PARTICLES; FILMS; INDIUM COMPOUNDS; IONS; MATERIALS; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; STABILITY

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.