Improved textured La2Zr2O7 buffer on La3TaO7 seed for all-MOD Buffer/YBCO coated conductors

The overall purpose of this research is to develop a potentially low-cost, high throughput, high yield, manufacturing process for buffer deposition, and to gain a fundamental understanding of buffer layers required for an all metal-organic deposition (MOD) based chemical solution approach. This understanding is critical to the development of a reliable, robust, low-cost, long-length manufacturing process of 2G wires. The standard RABiTS architectures consists of a starting template of biaxially textured Ni-W (5 at.%) substrate with a seed layer of Y2O3, a barrier layer of YSZ, and a CeO2 cap. In this three-layer architecture, all the buffers are deposited using reactive sputtering. We have recently demonstrated that the barrier properties and the performance of MOD La2Zr2O7 (LZO) match that of sputtered YSZ layers. In this work, the texture of MOD LZO was also improved by inserting a sputtered Y2O3 seed layer on which LZO grows without any degradation of texture. Significant improvement in the texture of sputtered Y2O3 seeds on NiW substrates is usually observed which is then transferred to the LZO layer. A key challenge for an all-solution approach is to replace the sputtered seed layer with a possible MOD seed layer with improved texture and on which no degradation of LZO texture occurs. Very recently, we have grown MOD La3TaO7 (LTO) seeds directly on biaxially textured Ni-W (3 at.%) with improved texture. In this study, we report a systematic investigation of the growth MOD LZO barrier layer on MOD LTO seeds. Preliminary results show that it is possible to grow MOD LZO with improved texture on MOD LTO seeds. This approach could be potentially used for future all MOD buffer/YBCO coated conductors