Published May 1988
| Version v1
Journal article
Thin film formation of 2-methyl-4-nitroaniline by ionized cluster beam technique
- 1. Hitachi Ltd., Ibaraki (Japan). Hitachi Research Lab.
Description
Thin films of 2-methyl-4-nitroaniline were prepared by an ionized cluster beam (ICB) technique. Their SEM photographs suggested that the ICB-deposited films are much denser than vacuum-deposited films. X-ray diffraction patterns suggested that the control of a preferential orientation is possible by changing the substrate temperature. (author)
Additional details
Publishing Information
- Journal Title
- Chem. Lett. (Tokyo)
- Journal Volume
- 1988
- Journal Issue
- 5
- Series
- Chem. Lett. (Tokyo).
- Journal Page Range
- 741-744
- ISSN
- 0366-7022
- CODEN
- CMLTA
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 19083889
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES;
- Descriptors DEI
- AMINES; AROMATICS; CLUSTER BEAMS; DEPOSITION; GRAIN DENSITY; IONIZATION; NITRO COMPOUNDS; THIN FILMS
- Descriptors DEC
- BEAMS; CRYSTAL STRUCTURE; FILMS; MICROSTRUCTURE; ORGANIC COMPOUNDS; ORGANIC NITROGEN COMPOUNDS