Ion beam radiation technique to control the atomic composition and properties of thin film materials

In this paper we are demonstrating the possibility of utilizing ion beam irradiation for direct transformation of the atomic composition and properties of thin-film materials to create functional nanoscale elements for various applications by means of selective removal of atoms (SRA) technique. Simple kinetic model of removal of atoms is presented. Some examples of using proton beam irradiation technique for creating metal nanowires in a dielectric matrix, as well as high-density patterned magnetic media are presented.