Investigation of the tribological behavior and its relationship to the microstructure and mechanical properties of a-SiC:H films elaborated by low frequency plasma assisted chemical vapor deposition
Creators
Description
Amorphous hydrogenated silicon carbide (a-SiC:H) coatings are promising candidates for tribological applications in the mechanical and aeronautical industries. Alternately high values of hardness H (15 < H < 32 GPa) and elastic modulus E contribute to their good wear resistance as well as to a low friction coefficient. The latter has been found to vary in the range 0.1 < μ < 0.65, depending upon the microstructure of the layers. The roughness of the films determined by atomic force microscopy is in all cases low (Ra ∼ 5 nm). Comparisons between the tests carried out in air and those performed under vacuum conditions point to a substantial role of the adhesive part of the friction coefficient in vacuum. They also highlight the role played by the transfer layer between the film and the pin in producing a low friction coefficient for several coatings. This transfer layer consists chiefly of silicon and oxygen (O/Si ∼ 2), whilst low quantities of carbon are also present.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2010.09.024Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2010.09.024;
- PII
- S0040-6090(10)01353-2;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 519
- Journal Issue
- 4
- Journal Page Range
- p. 1266-1271
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42069275
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ADHESIVES; ATOMIC FORCE MICROSCOPY; CARBON; CHEMICAL VAPOR DEPOSITION; COATINGS; FRICTION FACTOR; HARDNESS; LAYERS; MICROSTRUCTURE; OXYGEN; PLASMA; PRESSURE RANGE GIGA PA; SILICON CARBIDES; THIN FILMS; TRIBOLOGY; WEAR; WEAR RESISTANCE; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; CHEMICAL COATING; DEPOSITION; DIMENSIONLESS NUMBERS; ELECTRON SPECTROSCOPY; ELEMENTS; FILMS; MECHANICAL PROPERTIES; MICROSCOPY; NONMETALS; PHOTOELECTRON SPECTROSCOPY; PRESSURE RANGE; SILICON COMPOUNDS; SPECTROSCOPY; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.