Published 2017 | Version v1
Journal article

Disorder enabled band structure engineering of a topological insulator surface

  • 1. New York University, New York, NY (United States)
  • 2. Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Description

Three-dimensional topological insulators are bulk insulators with Z2 topological electronic order that gives rise to conducting light-like surface states. These surface electrons are exceptionally resistant to localization by non-magnetic disorder, and have been adopted as the basis for a wide range of proposals to achieve new quasiparticle species and device functionality. Recent studies have yielded a surprise by showing that in spite of resisting localization, topological insulator surface electrons can be reshaped by defects into distinctive resonance states. Here we use numerical simulations and scanning tunnelling microscopy data to show that these resonance states have significance well beyond the localized regime usually associated with impurity bands. Lastly, at native densities in the model Bi2X3 (X=Bi, Te) compounds, defect resonance states are predicted to generate a new quantum basis for an emergent electron gas that supports diffusive electrical transport.

Availability note (English)

Available from http://www.osti.gov/pages/servlets/purl/1347555; http://www.osti.gov/pages/biblio/1347555; DOE Accepted Manuscript full text, or the publishers Best Available Version will be available free of charge after the embargo period

Additional details

Publishing Information

Journal Title
Nature Communications
Journal Volume
8
Journal Page Range
vp.
ISSN
2041-1723

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United States
INIS RN
48058957
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
BISMUTH COMPOUNDS; COMPUTERIZED SIMULATION; ELECTRONIC STRUCTURE; SCANNING TUNNELING MICROSCOPY; TELLURIUM COMPOUNDS; THREE-DIMENSIONAL LATTICES
Descriptors DEC
CRYSTAL LATTICES; CRYSTAL STRUCTURE; MICROSCOPY; SIMULATION

Optional Information

Contract/Grant/Project number
AC02-76SF00515
Funding organization
USDOE (United States)
Secondary number(s)
OSTIID--1347555