Published December 2002 | Version v1
Journal article

Temperature dependence of the width of the deep-level band in silicon with a high concentration of defects

  • 1. Lublin Technical University, 20-618 Lublin (Poland)
  • 2. Belarussian State University, ul. Leningradskaya 14, Minsk, 220080 (Belarus)

Description

Temperature dependences of the peak location and the half-width of the absorption band related to neutral divacancies in the spectrum of Si irradiated with neutrons at a dose of 1019 cm-2 were studied. The results were analyzed in terms of the concept of the defect-level band, whose width depends on the degree of compensation and on temperature

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductors
Journal Volume
36
Journal Issue
12
Journal Page Range
p. 1326-1331
ISSN
1063-7826
CODEN
SMICES

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
35051954
Subject category
S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Numerical Data, Translation
Descriptors DEI
CRYSTAL DEFECTS; ELECTRONIC STRUCTURE; EXPERIMENTAL DATA; NEUTRON BEAMS; PHYSICAL RADIATION EFFECTS; SEMICONDUCTOR MATERIALS; SILICON; TEMPERATURE DEPENDENCE; VACANCIES
Descriptors DEC
BEAMS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DATA; ELEMENTS; INFORMATION; MATERIALS; NUCLEON BEAMS; NUMERICAL DATA; PARTICLE BEAMS; POINT DEFECTS; RADIATION EFFECTS; SEMIMETALS

Optional Information

Notes
Translated from Fizika i Tekhnika Poluprovodnikov, ISSN 0015-3222, 36, 1412-1417 (No. 12, 2002); (c) 2002 MAIK ''Nauka / Interperiodica''.