Ion behaviour in pulsed plasma regime by means of Time-resolved energy mass spectroscopy (TREMS) applied to an industrial radiofrequency Plasma Immersion Ion Implanter PULSION registered

In order to face the requirements for P+/N junctions requested for < 45 nm ITRS nodes, new doping techniques are studied. Among them Plasma Immersion Ion Implantation (PIII) has been largely studied. IBS has designed and developed its own PIII machine named PULSION registered . This machine is using a pulsed plasma. As other modem technological applications of low pressure plasma, PULSION registered needs a precise control over plasma parameters in order to optimise process characteristics. In order to improve pulsed plasma discharge devoted to PIII, a nitrogen pulsed plasma has been studied in the inductively coupled plasma (ICP) of PULSION registered and an argon pulsed plasma has been studied in the helicon discharge of the laboratory reactor of LPIIM (PHYSIS). Measurements of the Ion Energy Distribution Function (IEDF) with EQP300 (Hidden) have been performed in both pulsed plasma. This study has been done for different energies which allow to reconstruct the IEDF resolved in time (TREMS). By comparing these results, we found that the beginning of the plasma pulse, named ignition, exhaust at least three phases, or more. All these results allowed us to explain plasma dynamics during the pulse while observing transitions between capacitive and inductive coupling. This study leads in a better understanding of changes in discharge parameters as plasma potential, electron temperature, ion density