Published June 20, 1997
| Version v1
Journal article
Gas cluster ion beam processing
- 1. Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606-01 (Japan)
Description
Unique characteristics of gas cluster ion beam processing are reviewed. Cluster ion beams consisting of a few hundreds to thousands of atoms have been generated from various kinds of gas materials. Multi-collisions during the impact of accelerated cluster ions upon the substrate surfaces produce fundamentally low energy bombarding effects in a range of a few eV to hundreds of eV per atom at very high density. These bombarding characteristics can be applied to shallow ion implantation, high yield sputtering and smoothing, surface cleaning and low temperature thin film formation
Additional details
Identifiers
- DOI
- 10.1063/1.54519;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 416
- Journal Issue
- 1
- Journal Page Range
- p. 310-329
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- Symposium on similarities and differences between atomic nuclei and clusters
- Dates
- 1-4 Jul 1997
- Place
- Tsukuba (Japan)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40053824
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE; S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON; ATOMIC CLUSTERS; CLUSTER BEAMS; ELECTRIC CONDUCTIVITY; ENERGY BEAM DEPOSITION; EV RANGE; HELIUM IONS; ION IMPLANTATION; ION PAIRS; ION-ATOM COLLISIONS; MOLECULAR DYNAMICS METHOD; SPUTTERING; SUBSTRATES; SURFACE CLEANING; SURFACES; THIN FILMS
- Descriptors DEC
- ATOM COLLISIONS; BEAMS; CALCULATION METHODS; CHARGED PARTICLES; CLEANING; COLLISIONS; DEPOSITION; ELECTRICAL PROPERTIES; ELEMENTS; ENERGY RANGE; FILMS; FLUIDS; GASES; ION COLLISIONS; IONS; NONMETALS; PHYSICAL PROPERTIES; RARE GASES; SURFACE COATING; SURFACE FINISHING
Optional Information
- Notes
- (c) 1997 American Institute of Physics.