Published June 20, 1997 | Version v1
Journal article

Gas cluster ion beam processing

  • 1. Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606-01 (Japan)

Description

Unique characteristics of gas cluster ion beam processing are reviewed. Cluster ion beams consisting of a few hundreds to thousands of atoms have been generated from various kinds of gas materials. Multi-collisions during the impact of accelerated cluster ions upon the substrate surfaces produce fundamentally low energy bombarding effects in a range of a few eV to hundreds of eV per atom at very high density. These bombarding characteristics can be applied to shallow ion implantation, high yield sputtering and smoothing, surface cleaning and low temperature thin film formation

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
416
Journal Issue
1
Journal Page Range
p. 310-329
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
Symposium on similarities and differences between atomic nuclei and clusters
Dates
1-4 Jul 1997
Place
Tsukuba (Japan)

Optional Information

Notes
(c) 1997 American Institute of Physics.