Epitaxial Strain Controlled ''Charge Leakage'' AT LaMnO3 / SrTiO3 Interfaces
Creators
- 1. Universidad Complutense (Spain)
- 2. Unite Mixte de Physique CNRS/Thales, Palaiseau (France)
- 3. Instituto de Ciencia de Materiales de Madrid (Spain)
- 4. SpLine Spanish CRG Beamline at the ESRF (France)
- 5. Oak Ridge National Laboratory, TN (United States)
Description
We report on the charge transfer at the interface between a band (SrTiO3) and a Mott insulator (LaMnO3) in epitaxial superlattices. We have used combined atomic resolution electron microscopy and spectroscopy, synchrotron X ray reciprocal space maps and magneto transport measurements, to characterize the interface properties. The LaMnO3 layers are always started and terminated in (LaO) planes, giving an overall electron doping to the system. However, the direction of charge leakage is determined by the manganite to titanate thickness ratio in a way controlled by the different epitaxial strain patterns. This result may provide a clue to optimize oxide devices such as magnetic tunnel junctions and field effect transistors whose operation is determined by the interface properties.
Additional details
Identifiers
Publishing Information
- Journal Title
- Advanced Materials
- Journal Volume
- 22
- Journal Page Range
- p. 627
- ISSN
- 0966-2979
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 41078075
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S43: PARTICLE ACCELERATORS;
- Descriptors DEI
- ELECTRON MICROSCOPY; ELECTRONS; FIELD EFFECT TRANSISTORS; OXIDES; RESOLUTION; STRAINS; SUPERLATTICES; SYNCHROTRONS; THICKNESS; TITANATES
- Descriptors DEC
- ACCELERATORS; CHALCOGENIDES; CYCLIC ACCELERATORS; DIMENSIONS; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; MICROSCOPY; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES; TITANIUM COMPOUNDS; TRANSISTORS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Contract/Grant/Project number
- KC0201010; ERKCS89; AC05-00OR22725
- Notes
- doi 10.1002/adma.200902263
- Funding organization
- SC USDOE - Office of Science (United States)