Published May 1999 | Version v1
Journal article

Study on effect of low energy nitrogen ions implanted in solid uracil

  • 1. Academia Sinica, Hefei (China). Inst. of Plasma Physics, Centre of Ions Beam Bioengineering

Description

The change of the molecular structure of uracil induced by 25 keV N+ ions implantation is studied. The dose curve is obtained from the analysis of the ultraviolet spectra. The induced damage is analyzed by FT-IR. -NH2 group is proved to be produced by N+ ion beam with the analysis of quite sensitive ninhydrin reaction

Additional details

Publishing Information

Journal Title
Journal of Nuclear and Radiochemistry
Journal Volume
21
Journal Issue
2
Journal Page Range
p. 88-91
ISSN
0253-9950