Published March 1, 2006 | Version v1
Journal article

Fabrication of nickel oxide and Ni-doped indium tin oxide thin films using pyrosol process

  • 1. Department of Fine Material Engineering, Faculty of Textile Science and Technology, Shinshu University, 3-15-1, Tokida, Ueda-shi, Nagano 386-8567 (Japan)
  • 2. Department of Functional Polymer Science, Faculty of Textile Science and Technology, Shinshu University, 3-15-1, Tokida, Ueda-shi, Nagano 386-8567 (Japan)

Description

Organic light emitting diodes (OLEDs) need indium tin oxide (ITO) anodes with highly smooth surface. The work function of ITO, about 4.8 eV, is generally rather lower than the optimum level for application to OLEDs. In this work, NiO was deposited by pyrosol process on pyrosol ITO film to increase the work function of the ITO for improving the performance of OLEDs. It was confirmed that NiO was successfully deposited on pyrosol ITO film and the NiO deposition increased the work function of pyrosol ITO, using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM) and atmospheric photoelectron spectroscopy. Furthermore, doping ITO with Ni succeeded in producing the Ni-doped ITO film with high work function and lower sheet resistance

Additional details

Identifiers

DOI
10.1016/j.tsf.2005.07.102;
PII
S0040-6090(05)00965-X;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
498
Journal Issue
1-2
Journal Page Range
p. 240-243
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
3. Asian conference on chemical vapor deposition
Dates
12-14 Nov 2004
Place
Taipei, Taiwan (China)

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.