Published February 10, 2011 | Version v1
Journal article

The evolution behavior of structures and photoluminescence of K-doped ZnO thin films under different annealing temperatures

  • 1. College of Math and Physics, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing 210044, Jiangsu (China)
  • 2. Department of Applied Physics, Nanjing University of Science and Technology, Nanjing 210094 (China)

Description

Research highlights: → It is found that the 1 at.% K-doped ZnO thin film annealed in air at 500 deg. C has the best crystalline quality and ultraviolet emission performance. → The different annealing temperatures lead to different K-doping configurations in ZnO. → The blue emission probably results from K and Zn interstitial defects. - Abstract: In this work, 1 at.% K-doped ZnO thin films were prepared by sol-gel method on Si substrates. The evolution behavior of the structures and photoluminescence of these films under different annealing temperatures was deeply studied. The crystal structures and surface morphology of the samples were analyzed by an X-ray diffractometer and an atomic force microscope, respectively. The photoluminescence spectra were used to study the luminescent behavior of the samples. The results showed that the films had a hexagonal wurtzite structure and were preferentially oriented along the c-axis perpendicular to the substrate surface. All the samples showed a strong ultraviolet emission and a weak blue emission. With the increase of annealing temperature, the ZnO grains gradually grew up; at the same time, the blue emission gradually decreased. The sample annealed at 500 deg. C showed the best crystalline quality and strongest ultraviolet emission. The authors think that the blue emission in these samples is mainly connected with K interstitial defects. When the 1 at.% K-doped ZnO thin film is annealed at high temperatures (≥600 deg. C), most of K interstitials move into ZnO lattice sites replacing Zn. As a result, the blue emission resulting from K interstitial defects also decreased.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jallcom.2010.11.164

Additional details

Identifiers

DOI
10.1016/j.jallcom.2010.11.164;
PII
S0925-8388(10)02927-0;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
509
Journal Issue
6
Journal Page Range
p. 2942-2947
ISSN
0925-8388
CODEN
JALCEU

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.