An ultrathin nickel-based film electrodeposited from a Ni-Tris molecular precursor for highly efficient electrocatalytic water oxidation
- 1. State Key Laboratory of Fine Chemicals, Institute of Artificial Photosynthesis, DUT-KTH Joint Education and Research Center on Molecular Devices, Dalian University of Technology (DUT), Dalian, 116024 (China)
Description
Water splitting is one of the important and effective routes to produce hydrogen as applicable alternative to conventional fossil fuels. As we all know, oxygen evolution reaction (OER) is a key and restricted part of the overall water-spitting process. Highly efficient electrocatalysts are essential components to accelerate the rate of the OER and lower the overpotential. In this paper, an ultrathin nickel-based film on FTO (NiOx-Tris electrode) was prepared through five cycles of cyclic-voltammetry electrodeposition from a 0.1 M borate buffer solution (pH 9.2) that contained a molecular nickel complex as a precursor. The activity of the as-prepared catalyst film for OER was measured in near-neutral borate buffer solution (0.6 M, pH 9.2), and the results showed that the NiOx-Tris electrode exhibits a better catalytic activity over the catalyst (NiOx-aqua) that was derived from Ni2+ salts. In detail, the NiOx-Tris ultrathin film achieved a stable catalytic current density of ∼5.0 mA/cm2 at 1.3 V versus a normal hydrogen electrode for OER in borate buffer solution.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2018.06.167Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2018.06.167;
- PII
- S0013468618314555;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 283
- Journal Page Range
- p. 104-110
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 53038231
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- BORATES; CURRENT DENSITY; ELECTROCATALYSTS; ELECTRODEPOSITION; FLUORINE ADDITIONS; NANOFILMS; NICKEL COMPLEXES; OXIDATION; TIN OXIDES
- Descriptors DEC
- BORON COMPOUNDS; CATALYSTS; CHALCOGENIDES; CHEMICAL REACTIONS; COMPLEXES; DEPOSITION; ELECTROLYSIS; FILMS; LYSIS; MATERIALS; NANOMATERIALS; OXIDES; OXYGEN COMPOUNDS; SURFACE COATING; THIN FILMS; TIN COMPOUNDS; TRANSITION ELEMENT COMPLEXES
Optional Information
- Copyright
- Copyright (c) 2018 Elsevier Ltd. All rights reserved.