The effects of model parameter variations on high-fluence ion implantation
Creators
- 1. Salford Univ. (United Kingdom). Dept. of Electronic and Electrical Engineering
- 2. Bylgarska Akademiya na Naukite, Sofia (Bulgaria). Inst. po Elektronika
- 3. Univ. d'Alacant (Spain). Dept. de Fisica Aplicada
- 4. Univ. Complutense of Madrid (Spain). Dept. of Electricity and Electronics
Description
A general form of the balance equation, to describe the variation of concentration of atomic species during ion bombardment of solids, is employed to reveal the influence of model parameters (atomic volumes and target relaxation) in determining atomic redistribution during high-fluence ion implantation. The study, firstly, of a simple case, ion implantation without mixing, allows us to obtain analytic solutions of the balance equation and to perform an analysis of parametric dependences due to atomic volume mismatch. We also show the effects of atomic mixing and relaxation on the target density, obtained via full numerical solution of the balance equation. The importance of specifying appropriate atomic volumes for the different species involved in the description of mixing is stressed. (Author)
Additional details
Publishing Information
- Journal Title
- Vacuum
- Journal Volume
- 44
- Journal Issue
- 8
- Journal Page Range
- p. 783-789.
- ISSN
- 0042-207X
- CODEN
- VACUAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 24071223
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANALYTICAL SOLUTION; ATOMIC MODELS; CONCENTRATION RATIO; CONTINUITY EQUATIONS; ION IMPLANTATION; ION-ATOM COLLISIONS; MATHEMATICAL MODELS; NUMERICAL SOLUTION; RADIATION FLUX; SPUTTERING; TARGETS
- Descriptors DEC
- ATOM COLLISIONS; COLLISIONS; DIFFERENTIAL EQUATIONS; EQUATIONS; ION COLLISIONS; PARTIAL DIFFERENTIAL EQUATIONS