Analytical results for the cluster size distribution in controlled deposition processes
- 1. National Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083 (China)
- 2. College of Physics and Electronic Information Engineering, Wenzhou University, Wenzhou 325035 (China)
Description
This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases. (condensed matter: structure, thermal and mechanical properties)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-1056/19/2/026802Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics. B
- Journal Volume
- 19
- Journal Issue
- 2
- Journal Page Range
- [6 p.]
- ISSN
- 1674-1056
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45009746
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ADSORPTION; CRYSTAL GROWTH; DEPOSITION; KERNELS; PARTICLES; REACTION KINETICS; SOLID CLUSTERS; SUBSTRATES; SURFACES
- Descriptors DEC
- KINETICS; SORPTION