Published February 2010 | Version v1
Journal article

Analytical results for the cluster size distribution in controlled deposition processes

  • 1. National Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083 (China)
  • 2. College of Physics and Electronic Information Engineering, Wenzhou University, Wenzhou 325035 (China)

Description

This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases. (condensed matter: structure, thermal and mechanical properties)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/19/2/026802

Additional details

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
19
Journal Issue
2
Journal Page Range
[6 p.]
ISSN
1674-1056

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45009746
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ADSORPTION; CRYSTAL GROWTH; DEPOSITION; KERNELS; PARTICLES; REACTION KINETICS; SOLID CLUSTERS; SUBSTRATES; SURFACES
Descriptors DEC
KINETICS; SORPTION