Published October 21, 2020 | Version v1
Journal article

A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters

  • 1. Materia Nova Research Center, 3 Avenue Nicolas Copernic, Parc Initialis, 7000 Mons (Belgium)
  • 2. Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Universite de Mons, 23 Place du Parc, B-7000 Mons (Belgium)

Description

Ion acceleration in a bipolar high-power impulse magnetron sputtering discharge working with Ar gas and using a Ti cathode has been investigated. The multiple discharge diagnostic approaches have been implemented, including the target and substrate current probe measurements, mass spectrometry and laser-induced fluorescence. In particular, the current waveforms were analysed in detail, showing the particularities of the current evolution during the negative (plasma) and positive voltage pulses. It is shown that the substrate current during the positive voltage pulse reveals two peaks, corresponding, as suggested, to two groups of the positive ions repulsed from the cathode by the applied positive potential. These observations correlate well with the mass spectrometry measurements as well as with the two-dimensional ion density mapping performed for several discharge conditions by laser-induced fluorescence imaging technique. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6463/aba01e

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
53
Journal Issue
43
Journal Page Range
[12 p.]
ISSN
0022-3727
CODEN
JPAPBE