Published January 15, 2017 | Version v1
Journal article

A novel Ni2+-doped Ag3PO4 photocatalyst with high photocatalytic activity and enhancement mechanism

  • 1. College of Environment and Chemical Engineering, State Key Laboratory of Hollow-Fiber Membrane Materials and Membrane Processes, Tianjin Polytechnic University, Tianjin 300387 (China)
  • 2. College of Science, Tianjin University of Science & Technology, Tianjin, 300457 (China)

Description

Ni2+-doped Ag3PO4 (Ni2+-Ag3PO4) photocatalysts with superhigh activity for photodegradation of organic pollutants were prepared by a simple hydrothermal method. The photocatalysts were characterized with X-ray powder diffractometry, transmission electron microscopy, ultraviolet–visible absorption spectroscopy, X-ray photoelectron spectroscopy, measurement of total organic carbon, and electron paramagnetic resonance spectrometry. The photocatalysts were evaluated by methyl orange (MO) photodegradation experiments under visible light irradiation (λ > 420 nm). Comparative analysis showed the optimal doping dosage was 0.05 mol/L Ni2+. The optimal Ni2+-Ag3PO4 has an MO photodegradation rate constant four times larger than pure Ag3PO4. The photocatalytic ratio of 40 mg/L MO over the optimal Ni2+-Ag3PO4 after 10 min is 89%, which indicates excellent photocatalytic ability in high-concentration MO solutions. The Ni2+ doping into Ag3PO4 can increase the level of band gap, and accelerate the utilization of photons and the separation of photo-generated charges. Therefore, the Ni2+ doping into Ag3PO4 is responsible for the enhancement of photocatalytic ability. - Highlights: • Ni2+-modified with higher photodegradation ability was synthesized. • ·OH radicals were the main active species in the oxidation of MO. • The doping of Ni2+ in Ag3PO4 is responsible for the enhanced activity.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchemphys.2016.10.053

Additional details

Identifiers

DOI
10.1016/j.matchemphys.2016.10.053;
PII
S0254-0584(16)30806-9;

Publishing Information

Journal Title
Materials Chemistry and Physics
Journal Volume
186
Journal Page Range
p. 271-279
ISSN
0254-0584
CODEN
MCHPDR

Optional Information

Copyright
Copyright (c) 2016 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.