Low temperature deposition of metal nitrides by thermal decomposition of organometallic compounds

Decomposition reaction of dialkylamides of boron, silicon, tin, titanium, zirconium, niobium, and tantalum was investigated. The amides of transition metals decomposed to the corresponding nitrides at 300--5000C, although those of a typical group afforded elements themselves at higher temperatures in most cases. In the temperature dependence of the nitride deposition from tetrakis (dimethylamido)titanium(IV), two optimum temperature conditions were found at 4000C and at a temperature higher than 8000C in nitrogen or hydrogen atmosphere, but in argon low temperature deposition alone was possible. The low and high temperature processes are discussed in relation with the mass spectral analysis of the exhaust gases formed at the different temperature decompositions of the titanium amide