Published July 23, 2010 | Version v1
Journal article

Effect of thickness on the microstructural, optoelectronic and morphological properties of electron beam evaporated ZnTe films

  • 1. Department of Physics, Alagappa University, Karaikudi 630003 (India)
  • 2. Department of Physics, A.V.V.M Sri Pushpam College, Poondi, Thanjavur (India)
  • 3. Electrochemical Materials Science Division, Central Electrochemical Research Institute, Karaikudi 630006 (India)

Description

ZnTe films of different thicknesses were deposited on glass substrates at a substrate temperature of 300 oC. The thickness of the films varied in the range of 110-320 nm. The films exhibited cubic structure with preferential orientation in the (1 1 1) direction. A very high value of absorption co-efficient (104 cm-1) is observed. Band gap values in the range between 2.23 and 2.38 eV are observed when the film thickness was varied between 320 and 110 nm, respectively. The refractive index values are found to vary between 2.68 and 2.90 for the films of different thicknesses. It has been observed that the conductivity increases continuously with temperature as well as with thickness. Laser Raman spectra showed the presence of peaks at 206.8 and 411.2 cm-1corresponding to the first order and second order LO phonon of monophase ZnTe films. PL analysis confirmed the formation of monophase ZnTe films with nano grains.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jallcom.2010.04.191

Additional details

Identifiers

DOI
10.1016/j.jallcom.2010.04.191;
PII
S0925-8388(10)01058-3;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
502
Journal Issue
2
Journal Page Range
p. 434-438
ISSN
0925-8388
CODEN
JALCEU

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.