Published July 2021 | Version v1
Journal article

Inhibition of Mg activation in p-type GaN caused by thin AlGaN capping layer and impact of designing hydrogen desorption pathway

  • 1. Osaka University, Graduate School of Engineering, Suita, Osaka (Japan)
  • 2. Toyota Central R&D Labs., Inc., Nagakute, Aichi (Japan)
  • 3. Nagoya University, Institute of Materials and Systems for Sustainability, Nagoya, Aichi (Japan)

Description

Thermal activation of a Mg-doped GaN layer with a thin AlGaN capping layer was investigated by means of systematic electrical characterization. Two-dimensional electron gas generated at the AlGaN/GaN interface greatly inhibited activation of the underlying Mg-doped GaN layer. This finding is attributed to the charge states of the interstitial hydrogen atoms being released from the Mg-H complexes and their diffusivity being dependent on the Fermi level position in GaN-based heterostructures. Reasonable electrically active acceptor concentration in Mg-doped GaN was achieved by designing a hydrogen desorption pathway. (author)

Availability note (English)

Available from DOI: https://doi.org/10.35848/1882-0786/ac057d

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Express (Online)
Journal Volume
14
Journal Issue
7
Journal Page Range
p. 071001.1-071001.4
ISSN
1882-0786

Optional Information

Notes
34 refs., 4 figs.