Published April 23, 2007 | Version v1
Journal article

Controlling the ion flux on substrates of different geometry by sheath-lens focusing effect

  • 1. Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)

Description

It is shown that a three-dimensional plasma sheath lens that forms on biased electrodes interfacing insulators exhibits novel characteristics such as ion focusing on desired locations, controllability of ion flux uniformity, formation of passive surfaces and applicability to plasma diagnostics. The ion flux profile on substrates of different geometry is obtained by three dimensional simulations of potential distribution and ion trajectory, while experiments are realized in electropositive and electronegative DC and ICP discharges

Additional details

Identifiers

DOI
10.1016/j.tsf.2006.10.071;
PII
S0040-6090(06)01184-9;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
12
Journal Page Range
p. 4853-4859
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
3. International symposium on dry process
Dates
28-30 Nov 2005
Place
Jeju (Korea, Republic of)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39018725
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
GEOMETRY; IONS; PLASMA DIAGNOSTICS; PLASMA SHEATH; SIMULATION; SUBSTRATES; THREE-DIMENSIONAL CALCULATIONS
Descriptors DEC
CHARGED PARTICLES; MATHEMATICS

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.