Published April 23, 2007
| Version v1
Journal article
Controlling the ion flux on substrates of different geometry by sheath-lens focusing effect
Creators
- 1. Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
Description
It is shown that a three-dimensional plasma sheath lens that forms on biased electrodes interfacing insulators exhibits novel characteristics such as ion focusing on desired locations, controllability of ion flux uniformity, formation of passive surfaces and applicability to plasma diagnostics. The ion flux profile on substrates of different geometry is obtained by three dimensional simulations of potential distribution and ion trajectory, while experiments are realized in electropositive and electronegative DC and ICP discharges
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2006.10.071;
- PII
- S0040-6090(06)01184-9;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 515
- Journal Issue
- 12
- Journal Page Range
- p. 4853-4859
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 3. International symposium on dry process
- Dates
- 28-30 Nov 2005
- Place
- Jeju (Korea, Republic of)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39018725
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- GEOMETRY; IONS; PLASMA DIAGNOSTICS; PLASMA SHEATH; SIMULATION; SUBSTRATES; THREE-DIMENSIONAL CALCULATIONS
- Descriptors DEC
- CHARGED PARTICLES; MATHEMATICS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.