Polarization-dependent spectroscopic study of M-plane GaN on γ-LiAlO2
- 1. Paul-Drude-Institut fuer Festkoerperelektronik, Hausvogteiplatz 5-7, 10117 Berlin (Germany)
Description
We investigate the polarization dependence of the absorption, reflectance, and photoreflectance spectra of a compressively strained, M-plane, wurtzite GaN(11(bar sign)00) film grown by molecular-beam epitaxy on a γ-LiAlO2(100) substrate. The measurements are done with the electric-field vector (E) of the probe light being parallel ((parallel sign)) and perpendicular ((perpendicular sign)) to the c axis of GaN, which lies in the growth plane. We observe a significant increase in the effective optical band gap of the M-plane GaN film for E(parallel sign)c compared to its value for E(perpendicular sign)c. This result is explained by including the effect of the M-plane biaxial compressive strain on the electronic band structure of GaN. We also determine the extraordinary refractive index of GaN at energies below its band gap from the reflectance measurements
Additional details
Identifiers
- DOI
- 10.1063/1.1434306;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 80
- Journal Issue
- 3
- Journal Page Range
- p. 413-415
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35011194
- Subject category
- S36: MATERIALS SCIENCE; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ENERGY GAP; GALLIUM COMPOUNDS; LITHIUM COMPOUNDS; MOLECULAR BEAM EPITAXY; POLARIZATION; REFLECTIVITY; REFRACTIVE INDEX; SEMICONDUCTOR MATERIALS; SPECTRAL REFLECTANCE; SPECTROSCOPY; THIN FILMS
- Descriptors DEC
- ALKALI METAL COMPOUNDS; CRYSTAL GROWTH METHODS; EPITAXY; FILMS; MATERIALS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; SURFACE PROPERTIES
Optional Information
- Notes
- (c) 2002 American Institute of Physics.