Published March 15, 2006 | Version v1
Journal article

Effect of thermal annealing on the optical properties of low-energy Cu-implanted silica glass

  • 1. Center for Electron Microscopy, Wuhan University, Wuhan 430072 (China)
  • 2. Department of Physics, Wuhan University, Wuhan 430072 (China)
  • 3. Department of Physics, Wuhan University, Wuhan 430072 (China) and Center for Electron Microscopy, Wuhan University, Wuhan 430072 (China)

Description

Cu nanoclusters embedded in silica glass were formed by ion implantation with different doses. Optical absorption spectra of the implanted samples showed peaks around 570 nm, attributed to the surface plasmon resonance (SPR) absorption of Cu nanoclusters. Optical absorption increased with the increasing of doses, but decreased for dose higher than 1.5x1017 ions/cm2 due to the surface-sputtering effect. The positions of resonance peaks were slowly red-shifted with increasing annealing temperature in oxidizing atmosphere. The red-shift is mainly attributed to the interaction of Cu nanoclusters with diffused oxygen from the oxidizing atmosphere. With increasing annealing temperature, a new absorption at 300 nm was observed while the absorption belonging to SPR disappeared. The formation of Cu nanoclusters was also observed by transmission electron microscopy measurement

Additional details

Identifiers

DOI
10.1016/j.physb.2005.12.246;
PII
S0921-4526(05)01651-0;

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
373
Journal Issue
2
Journal Page Range
p. 341-345
ISSN
0921-4526
CODEN
PHYBE3

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.