Published May 2003 | Version v1
Journal article

Feasibility study of self-lubrication by chlorine implantation

Description

Implantation of chlorine into titanium nitride (TiN) coating on the high-speed steel substrate has succeeded in significant reduction of wear rate and friction coefficient for original TiN under dry wear condition. Through precise investigation on the surface reaction in the wear track, in situ formation of oxygen-deficient titanium oxides was found to play a role as a lubricious oxide. In the present paper, this self-lubrication mechanism is further investigated for various wearing conditions. For wide range of sliding speed and normal load in the wear map, the wear volume of a counter material is actually reduced with comparison to the un-implanted TiN. Effect of the ion implantation dose on this self-lubrication mechanism is also studied for practical use. Some comments are made on further application of this self-lubrication to manufacturing

Additional details

Identifiers

PII
S0168583X03005214;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
207
Journal Issue
1
Journal Page Range
p. 45-54
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
Symposium on ion beam processing and modification of glasses and ceramics
Dates
28 Apr - 1 May 2002
Place
St Louis, MO (United States)

INIS

Country of Publication
Netherlands
Country of Input or Organization
Mexico
INIS RN
35042750
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHLORINE; CHLORINE IONS; FEASIBILITY STUDIES; ION IMPLANTATION; LUBRICATION; STEELS; SUBSTRATES; TITANIUM NITRIDES
Descriptors DEC
ALLOYS; CARBON ADDITIONS; CHARGED PARTICLES; ELEMENTS; HALOGENS; IONS; IRON ALLOYS; IRON BASE ALLOYS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; TITANIUM COMPOUNDS; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENT COMPOUNDS

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.