Published 1988 | Version v1
Book

Applications of Moessbauer spectroscopy to characterize highly doped semiconductors

  • 1. Aarhus Univ. (Denmark). Inst. of Physics

Description

Silicon can be doped with electrically active donors (P, As, Sb) to levels exceeding solid-solubility limits by means of laser- or incoherent-light annealing techniques applied to ion-implanted, amorphized layers. Moessbauer spectroscopy utilizing additionally implanted (radioactive) probe atoms has been employed to characterize some properties of highly doped material. Recent examples are given of the type of microscopic information obtained from such studies. 12 refs.; 4 figs

Additional details

Publishing Information

Publisher
Kluwer Academic.
Imprint Place
Dordrecht (Netherlands)
ISBN
90-247-3703-6
Imprint Title
Nuclear physics applications on materials science
Imprint Pagination
468 p.
Journal Volume
144
Series
NATO ASI Series E.;Applied Sciences.
Journal Page Range
p. 167-172.

Conference

Title
NATO Advanced Science Institute on nuclear physics applications on materials science.
Dates
6-18 Sep 1987.
Place
Viana do Castelo (Portugal).

Optional Information

Notes
Imprint:Includes index.
Collaborations
ISOLDE Collaboration, CERN, Geneva, Switzerland.