Published October 2003 | Version v1
Journal article Metadata-only

Hybrid evaporation: Glow discharge source for plasma immersion ion implantation

Creators

  • 1. Department of 702, School of Mechanical Engineering and Automation, Beijing University of Aeronautics and Astronautics, Beijing 100083 (China)
  • 2. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong (China)
  • 3. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Hong Kong (China)

Description

In order to achieve stable operation for elements with a low melting point or high vapor pressure, a quasiequilibrium evaporation-glow discharge evaporation source has been designed and investigated for plasma immersion ion implantation. The important relationship between the pressure in the evaporation chamber and the implantation chamber is studied for optimal performance. Our experimental results show that the hybrid evaporation-glow discharge source is an effective method to produce ions from materials with low melting point and high vapor pressure

Additional details

Identifiers

DOI
10.1063/1.1606535;

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
74
Journal Issue
10
Journal Page Range
p. 4301-4304
ISSN
0034-6748
CODEN
RSINAK

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
36005609
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S43: PARTICLE ACCELERATORS;
Descriptors DEI
EVAPORATION; GLOW DISCHARGES; HYBRIDIZATION; ION IMPLANTATION; ION SOURCES; MELTING POINTS; PLASMA; VAPOR PRESSURE
Descriptors DEC
ELECTRIC DISCHARGES; PHASE TRANSFORMATIONS; PHYSICAL PROPERTIES; THERMODYNAMIC PROPERTIES; TRANSITION TEMPERATURE

Optional Information

Notes
(c) 2003 American Institute of Physics.