Applicaltion of technique of cathode sputtering, involving vacuum interlocking the discharge region for the measurement of condensation coefficients

Application of a technique of cathode sputtering, involving vacuum interlocking the discharge region, for the measurement of coefficients of reactive gases condensation on freshly deposited metal films is studied. It is shown that condensation coefficients of nitrogen and oxygen on molybdenum, tungsten and vanadium have a value of not less than 0.1