Published July 31, 2007 | Version v1
Journal article

Pulsed laser deposition of doped skutterudite thin films

  • 1. National Institute for Lasers, Plasma and Radiation Physics, P.O. Box MG-16, RO-77125 Magurele (Romania)
  • 2. Laboratoire de Physique des Materiaux, UMR 7556, Ecole Nationale Superieure des Mines de Nancy, Parc de Saurupt, F-54042 Nancy (France)

Description

Ca xCo4Sb12 skutterudite thin films have been prepared by pulsed laser deposition using a Nd:YAG laser working at 532 or 266 nm of wavelength. Characterization has been carried out by X-ray diffraction, atomic force microscopy and scanning electron microscopy. Emphasis has been put on the difficulty to obtain the skutterudite phase. Influence of the deposition temperature, the way of sticking the substrate, the laser fluence, the base pressure prior to deposition and the laser wavelength has been studied. All parameters revealed to have a drastic effect, and the skutterudite could only be achieved in a very narrow range of temperature and laser fluence, for a given wavelength, showing the importance on how these parameters are measured to ensure reproducible results

Additional details

Identifiers

DOI
10.1016/j.apsusc.2007.02.149;
PII
S0169-4332(07)00371-6;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
253
Journal Issue
19
Journal Page Range
p. 8097-8101
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
Photon-assisted synthesis and processing of functional materials
Acronym
E-MRS-H Symposium
Dates
29 May - 2 Jun 2006
Place
Nice (France)

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.