Published July 2015 | Version v1
Journal article

Mechanism of reverse-offset printing

  • 1. Department of Printed Electronics, Korea Institute of Machinery and Materials (Korea, Republic of)

Description

We propose a mechanism for reverse-offset printing based on a mathematical model. In reverse-offset printing, high resolution is achieved by patterning a coated, thin ink film with an intaglio-patterned cliché. By using the relationships among the ink blanket adhesion strength, the ink cliché adhesion strength, and the ink cohesion strength, a criterion for successful patterning is derived. We found that there is a printing window in the ink blanket adhesion strength that depends on the shear strength of the ink film and the dimensions of the pattern. The printing window diminishes as the line width decreases, resulting in a minimum printable line width. The proposed mechanism was verified by printing patterns with various shapes and dimensions. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0960-1317/25/7/075019

Additional details

Publishing Information

Journal Title
Journal of Micromechanics and Microengineering. Structures, Devices and Systems
Journal Volume
25
Journal Issue
7
Journal Page Range
[7 p.]
ISSN
0960-1317
CODEN
JMMIEZ

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47081114
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ADHESION; FILMS; INKS; LINE WIDTHS; MATHEMATICAL MODELS; RESOLUTION; SHAPE; SHEAR PROPERTIES
Descriptors DEC
MECHANICAL PROPERTIES