Published February 29, 2008 | Version v1
Journal article

Tungsten doped chromium nitride coatings

  • 1. Electronics and Optoelectronics Research Laboratories, Industrial Technology Research Institute, Chutung, Taiwan (China)
  • 2. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan (China)

Description

Chromium tungsten nitride films were deposited using magnetron sputtering with ion beam assistance. The content of the films was controlled through the power supplied to the chromium and tungsten targets. Results indicate that the tungsten atoms incorporated into chromium nitride films and formed the chromium tungsten nitride solid solution phase. Moreover, results of this study provide further insight into how various concentrations of tungsten affect the lattice constant, preferred orientation, crystallite size, surface morphology, hardness, internal stress, and adhesion of the films

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2007.10.007

Additional details

Identifiers

DOI
10.1016/j.tsf.2007.10.007;
PII
S0040-6090(07)01658-6;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
516
Journal Issue
8
Journal Page Range
p. 1877-1882
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.