Published August 1980 | Version v1
Journal article

rf study of the cathode sheath in a Penning discharge

  • 1. Saha Institute of Nuclear Physics, Calcutta-700009, India

Description

The cathode sheath in a cold-cathode Penning discharge operating in the high-pressure mode has been investigated by using an rf impedance method. The effect of the presheath lying between the sheath and the plasma has been taken into consideration in deriving the sheath parameters from the impedance of the discharge, measured at two frequencies, under various discharge conditions. The sheath thickness and the dc incremental resistance of the sheath are found to decrease with the discharge current (the static magnetic field being held fixed), while these parameters decrease first, and then remain almost unchanged, if the magnetic field is increased

Additional details

Publishing Information

Journal Title
J. Appl. Phys.
Journal Volume
51
Journal Issue
8
Series
J. Appl. Phys.
Journal Page Range
4102-4105
ISSN
0021-8979

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
11563478
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
CATHODES; ELECTRIC CONDUCTIVITY; FREQUENCY DEPENDENCE; IMPEDANCE; MAGNETIC FIELDS; PENNING DISCHARGES; PLASMA; RF SYSTEMS; THICKNESS
Descriptors DEC
DIMENSIONS; ELECTRIC DISCHARGES; ELECTRICAL PROPERTIES; ELECTRODES; PHYSICAL PROPERTIES