Different material sputtering by ions and atoms

The results of polycrystalline copper sputtering by argon ions and atoms are presented. Arc discharge plasma with a hot cathode was used as a source, polycrystalline copper was utilized as sputtering material. Dependences of the coefficient of copper sputtering on energy of argon ions and atoms are obtained. Complete agreement of the coefficients of copper sputtering and monocharged ions up to 1.2 keV is observed. The results of comparison of complete and atomic sputtering permit to consider the technique for determination of sputtering coefficients developed by the authors rather reliable