Published November 17, 2008 | Version v1
Journal article Metadata-only

Multiple pulse thermal damage thresholds of materials for x-ray free electron laser optics investigated with an ultraviolet laser

Creators

  • 1. Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, California 94539 (United States)
  • 2. Kovio, Inc., 1145 Sonora Court, Sunnyvale, California 94086 (United States)

Description

Optical elements to be used for x-ray free electron lasers (XFELs) must withstand multiple high-fluence pulses. We have used an ultraviolet laser to study the damage of two candidate materials, crystalline Si and B4C-coated Si, emulating the temperature profile expected to occur in optics exposed to XFEL pulses. We found that the damage threshold for 105 pulses is ∼20% to 70% lower than the melting threshold

Additional details

Identifiers

DOI
10.1063/1.3021081;

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
93
Journal Issue
20
Journal Page Range
p. 201105-201105.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40051136
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
BORON CARBIDES; DAMAGE; FREE ELECTRON LASERS; MELTING; OPTICS; PULSES; SEMICONDUCTOR MATERIALS; SILICON; ULTRAVIOLET RADIATION; X RADIATION
Descriptors DEC
BORON COMPOUNDS; CARBIDES; CARBON COMPOUNDS; ELECTROMAGNETIC RADIATION; ELEMENTS; IONIZING RADIATIONS; LASERS; MATERIALS; PHASE TRANSFORMATIONS; RADIATIONS; SEMIMETALS

Optional Information

Notes
(c) 2008 American Institute of Physics