Bipolar resistive switching properties of Ti-CuO/(hexafluoro-hexa-peri-hexabenzocoronene)-Cu hybrid interface device: Influence of electronic nature of organic layer
- 1. Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016 (India)
- 2. Surface Physics Group, National Physical Laboratory (CSIR), New Delhi-110012 (India)
- 3. Max-Planck Institute for Polymer Research, D-55128 Mainz (Germany)
Description
This study reports the change in the structural and junction properties of Ti-CuO-Cu structure on incorporation of a 2-dimensional (2D) organic layer comprising of n-type hexafluoro-hexa-peri-hexabenzocoronene (6F-HBC). A bipolar resistive switching is observed in the device having interface between sputter deposited copper oxide (CuO) and vacuum sublimated 6F-HBC hybrid interface. The CuO/6F-HBC hybrid interface exhibits rectifying I-V characteristics in complete contrast to the ohmic and rectifying characteristics of junctions based on individual 6F-HBC and CuO layers. Large change in resistive switching property from unipolar resistive switching in CuO/HBC to bipolar resistive switching in CuO/6F-HBC interface was observed. At the CuO/6F-HBC interface, C1s peak corresponding to fluorinated carbon is shifted by 0.68 eV towards higher binding energy (BE) side and O1s peak due to non-lattice oxygen is shifted by 0.6 eV towards lower BE, confirming the interaction of O2− ion in CuO with fluorinated carbon atoms in 6F-HBC at the hybrid interface. Correlation between conductive atomic force microscopy images and atomic force microscopy topography images, I-V characteristics in conducting, non-conducting, and pristine regions along with x-ray photoelectron spectroscopy results establishes the important role of hybrid interface to determining the resistive switching properties. This study demonstrates that the resistive switching and interface properties of a hybrid device based on inorganic and organic 2D materials can be modified by changing the electronic properties of organic layer by attaching suitable functional groups.
Additional details
Identifiers
- DOI
- 10.1063/1.4807411;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 113
- Journal Issue
- 20
- Journal Page Range
- p. 203706-203706.7
- ISSN
- 0021-8979
- CODEN
- JAPIAU
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44117412
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; BINDING ENERGY; COPPER; COPPER OXIDES; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC CONTACTS; HETEROJUNCTIONS; INTERFACES; LAYERS; ORGANIC SEMICONDUCTORS; SEMICONDUCTOR JUNCTIONS; SUBLIMATION; SUPERCONDUCTING JUNCTIONS; SURFACES; TITANIUM; TWO-DIMENSIONAL CALCULATIONS; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHALCOGENIDES; COPPER COMPOUNDS; ELECTRICAL EQUIPMENT; ELECTRICAL PROPERTIES; ELECTRON SPECTROSCOPY; ELEMENTS; ENERGY; EQUIPMENT; EVAPORATION; MATERIALS; METALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHASE TRANSFORMATIONS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; SEMICONDUCTOR JUNCTIONS; SEMICONDUCTOR MATERIALS; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Notes
- (c) 2013 AIP Publishing LLC