Investigating the effect of the RF power and isothermal annealing on graphitization of sputtered deposited carbon thin films. P. 10

In the present work, the effect of deposition parameters and vacuum annealing to enhance the graphitization in the carbon thin films has been studied. The films were deposited using RF magnetron sputtering of carbon target by Ar ion at RF Power of 50W, 100W and 150W respectively. From the Raman study, it was observed that with the increase in RF Power, the disorder in the film decreases resulting in the increase in the graphitization extent in the film. Furthermore, the isothermal annealing study on sample deposited at 50W, shows that with the increase in temperature, a better graphitization in comparison to as deposited film can be successfully achieved. (author)