Published May 2018 | Version v1
Journal article

A Functional Material Based Heterojunction Diode

  • 1. Al al-Bayt University, Department of Physics (Jordan)
  • 2. Kwame Nkrumah University of Science and Technology, Department of Materials Engineering, College of Engineering (Ghana)
  • 3. King Abdulaziz University, Department of Physics, Faculty of Science (Saudi Arabia)
  • 4. Pittsburg State University, Department of Chemistry (United States)
  • 5. King Saud University, Department of Astronomy and Physics, College of Science (Saudi Arabia)
  • 6. Suez Canal University, Department of Physics, Faculty of Science (Egypt)

Description

In this study, the phosphotungstic acid /p-Si diode was fabricated by a drop coating method. The fabricated diode had excellent rectifying properties. The electrical properties of the diode were investigated in the temperature range of 50-400 K. The optical band gap of the phosphotungstic acid film was determined and found to be 3.66 eV. The electrical and photoresponse properties of an Al/p-Si-phosphotungstic acid/Al photodiode were studied. The electronic parameters such as ideality factor (n), barrier height (ΦB) and series resistance (Rs) were found to be strongly temperature dependent.

Additional details

Identifiers

Publishing Information

Journal Title
Silicon (Print)
Journal Volume
10
Journal Issue
3
Journal Page Range
p. 737-746
ISSN
1876-990X

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Copyright (c) 2017 Springer Science+Business Media Dordrecht