Published August 1990
| Version v1
Journal article
Inhibited dark-line defect formation in strained InGaAs/AlGaAs quantum well lasers
- 1. McDonnell Douglas Electronic Systems Co., Elmsford, NY (USA)
- 2. David Sarnoff Research Center, Princeton, NJ (USA)
Description
Dark-line defect formation is compared in GaAs/AlGaAs and strained InGaAs/AlGaAs quantum well lasers. Dark-line defects have high growth velocity along (100) in GaAs quantum well lasers, causing rapid degradation. In contrast, the (100) dark-line defect is suppressed in the structures with a strained InGaAs quantum well, so that rapid degradation does not occur
Additional details
Publishing Information
- Journal Title
- IEEE Photonics Technology Letters
- Journal Volume
- 2
- Journal Issue
- 8
- Series
- IEEE Photonics Technol. Lett.
- Journal Page Range
- 531-533
- ISSN
- 1041-1135
- CODEN
- IPTLE
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22000017
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- ALUMINIUM ARSENIDES; GALLIUM ARSENIDES; INDIUM ARSENIDES; MATERIALS; QUANTUM EFFICIENCY; SEMICONDUCTOR LASERS; STIMULATED EMISSION; STRAINS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; AMPLIFIERS; ARSENIC COMPOUNDS; ARSENIDES; EFFICIENCY; EMISSION; ENERGY-LEVEL TRANSITIONS; EQUIPMENT; GALLIUM COMPOUNDS; INDIUM COMPOUNDS; LASERS; PNICTIDES; SEMICONDUCTOR DEVICES; SOLID STATE LASERS