Published August 1990 | Version v1
Journal article

Inhibited dark-line defect formation in strained InGaAs/AlGaAs quantum well lasers

  • 1. McDonnell Douglas Electronic Systems Co., Elmsford, NY (USA)
  • 2. David Sarnoff Research Center, Princeton, NJ (USA)

Description

Dark-line defect formation is compared in GaAs/AlGaAs and strained InGaAs/AlGaAs quantum well lasers. Dark-line defects have high growth velocity along (100) in GaAs quantum well lasers, causing rapid degradation. In contrast, the (100) dark-line defect is suppressed in the structures with a strained InGaAs quantum well, so that rapid degradation does not occur

Additional details

Publishing Information

Journal Title
IEEE Photonics Technology Letters
Journal Volume
2
Journal Issue
8
Series
IEEE Photonics Technol. Lett.
Journal Page Range
531-533
ISSN
1041-1135
CODEN
IPTLE