Published December 2015
| Version v1
Journal article
Deposition of copper coatings in a magnetron with liquid target
Creators
- 1. National Research Nuclear University MEPhI (Moscow Engineering Physics Institute) (Russian Federation)
Description
Copper coatings were deposited on monocrystalline Si substrates using a magnetron discharge with a liquid cathode in the metal vapour plasma. During the deposition, the bias voltage in the range from 0 V to–400 V was applied to the substrate. The prepared films were investigated by a scanning electron microscope, and their adhesive properties were studied using a scratch tester. It was demonstrated that the adhesion of the deposited films strongly depends on the bias voltage and varies in a wide range
Additional details
Identifiers
Publishing Information
- Journal Title
- Physics of Atomic Nuclei
- Journal Volume
- 78
- Journal Issue
- 14
- Journal Page Range
- p. 1674-1676
- ISSN
- 1063-7788
- CODEN
- PANUEO
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47041681
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ADHESION; ADHESIVES; CATHODES; COATINGS; COPPER; DEPOSITION; ELECTRIC POTENTIAL; FILMS; LIQUIDS; MAGNETRONS; PLASMA; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; VAPORS
- Descriptors DEC
- ELECTRODES; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FLUIDS; GASES; METALS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; SEMIMETALS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2015 Pleiades Publishing, Ltd.