Published June 2013 | Version v1
Journal article

Diffusion of silver over atomically clean silicon surfaces

  • 1. Russian Academy of Sciences, Rzhanov Institute of Semiconductor Physics, Siberian Branch (Russian Federation)

Description

The diffusion of silver the (111), (100), and (110) silicon surfaces is studied by Auger electron spectroscopy and low-energy electron diffraction. The mechanisms of diffusion over the (111) and (110) surfaces are revealed, and the temperature dependences of diffusion coefficients are measured. An anisotropy of silver diffusion over the (110) surface is detected

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Experimental and Theoretical Physics
Journal Volume
116
Journal Issue
6
Journal Page Range
p. 952-956
ISSN
1063-7761
CODEN
JTPHES

INIS

Optional Information

Copyright
Copyright (c) 2013 Pleiades Publishing, Ltd.
Notes
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