Published December 1988 | Version v1
Journal article

Total dose radiation characteristics of SOI MOSFETS fabricated using ISLANDS technology

  • 1. Semiconductor Process Lab., Texas Instruments Inc., Dallas, TX (USA)

Description

Total dose radiation results of n- and p-channel SOI MOSFETs fabricated using ISLANDS (oxidation of porous silicon) technology and subjected to /sup 60/Co gamma radiation are reported for the first time. The back-gates of both n- and p-channel transistors were hard to 1 Mrad(Si) with either -5 or 0 V on the substrate during irradiation. The build-up of radiation induced interface traps at the back-gate of n-channel MOSFETs compensated for the threshold voltage shift due to oxide trapped charges. Front-gate hardness was similar to that of bulk MOSFETs

Additional details

Publishing Information

Journal Title
IEEE Transactions on Nuclear Science
Journal Volume
35
Journal Issue
6
Series
IEEE Trans. Nucl. Sci.
Journal Page Range
1650-1652
ISSN
0018-9499
CODEN
IETNA

Conference

Title
25. annual conference on nuclear and space radiation effects.
Dates
12-15 Jul 1988.
Place
Portland, OR (USA).

Optional Information

Secondary number(s)
CONF-880730--.