Published 2001 | Version v1
Miscellaneous

Physical-chemical etching of GaN layers on sapphire

  • 1. Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw (Poland)

Description

no abstract available

Part of:
Abstracts of 3. International Conference Novel Applications of Wide Bandgap Layers

Additional details

Publishing Information

Publisher
Oficyna Wydawnicza Politechniki Warszawskiej
ISBN
0-7803-7136-4
Imprint Title
Abstracts of 3. International Conference Novel Applications of Wide Bandgap Layers
Imprint Pagination
207 p.
Journal Page Range
p. 159-160

Conference

Title
Novel Applications of Wide Bandgap Layers
Acronym
3. International Conference
Dates
26-30 Jun 2001
Place
Zakopane (Poland)

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
33033803
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
No Abstract, Conference, Non-conventional Literature
Descriptors DEI
ALUMINIUM OXIDES; ETCHING; GALLIUM NITRIDES; ION BEAMS; KINETICS; PLASMA; RADIOWAVE RADIATION; SAPPHIRE; SUBSTRATES; THIN FILMS
Descriptors DEC
ALUMINIUM COMPOUNDS; BEAMS; CHALCOGENIDES; CORUNDUM; ELECTROMAGNETIC RADIATION; FILMS; GALLIUM COMPOUNDS; MINERALS; NITRIDES; NITROGEN COMPOUNDS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PNICTIDES; RADIATIONS; SURFACE FINISHING

Optional Information

Notes
1 fig