Secondary electron emission from a metal surface bombarded by slow multiply charged ions

Pulse height distributions of a microchannel plate (MCP) for impact of slow multiply charged ions have been measured. It was observed that a relative gain of the MCP increases with an increase of the charge state of incident ions. Such gain characteristics are discussed in connection with secondary electron emission yield at the input of the MCP. Next, absolute values of electron emission yield γ for impact of Arq+ (q=1-8) on a polycrystalline tantalum and gold surface have been measured. The values of γ are nearly proportional to the total potential (neutralization) energy of the incident ions. (author)