Published August 28, 2015 | Version v1
Journal article

Plasma assisted synthesis of vanadium pentoxide nanoplates

  • 1. Thin film laboratory, Department of Physics, Indian Institute of Technology Delhi, Hauz Khas, New Delhi-110016 (India)

Description

In this work, we report the growth of α-V2O5 (orthorhombic) nanoplates on glass substrate using plasma assisted sublimation process (PASP) and Nickel as catalyst. 100 nm thick film of Ni is deposited over glass substrate by thermal evaporation process. Vanadium oxide nanoplates have been deposited treating vanadium metal foil under high vacuum conditions with oxygen plasma. Vanadium foil is kept at fixed temperature growth of nanoplates of V2O5 to take place. Samples grown have been studied using XPS, XRD and HRTEM to confirm the growth of α-phase of V2O5, which revealed pure single crystal of α- V2O5 in orthorhombic crystallographic plane. Surface morphological studies using SEM and TEM show nanostructured thin film in form of plates. Uniform, vertically aligned randomly oriented nanoplates of V2O5 have been deposited

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1675
Journal Issue
1
Journal Page Range
p. 030040-030040.4
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
4. national conference on advanced materials and radiation physics
Acronym
AMRP-2015
Dates
13-14 Mar 2015
Place
Longowal (India)

Optional Information

Notes
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