Published 2000 | Version v1
Report Open

Adiabatic plasma buncher

Creators

  • 1. Istituto Nazionale di Fisica Nucleare, Laboratori Nazionali di Frascati, Frascati, RM (Italy)
  • 2. Los Angeles Univ. of Southern California, Los Angeles, CA (United States)
  • 3. Istituto Nazionale di Fisica Nucleare, Milan (Italy)
  • 4. Brookhaven National Laboratory, Upton, NY (United States)

Description

In this paper is presented a new scheme of injection into a plasma accelerator, aimed at producing a high quality beam while relaxing the demands on the bunch length of the injected beam. The beam dynamics in the injector, consisting of a high voltage pulsed photo-diode, is analyzed and optimized to produce a λp/20 long electron bunch at 2.5 MeV. This bunch is injected into a plasma wave in which it compresses down to λp/100 while simultaneously accelerating up to 250 MeV. This simultaneous bunching and acceleration of a high quality beam requires a proper combination of injection energy and injection phase. Preliminary results from simulations are shown to assess the potentials of the scheme

Availability note (English)

Available from INIS in electronic form

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Additional details

Publishing Information

Imprint Pagination
13 p.
Report number
LNF-P--00-12

INIS

Country of Publication
Italy
Country of Input or Organization
Italy
INIS RN
31065718
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
BEAM BUNCHING; PHOTODIODES; PLASMA BEAM INJECTION; PLASMA GUNS; PLASMA WAVES
Descriptors DEC
BEAM DYNAMICS; BEAM INJECTION; DYNAMICS; MECHANICS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES