Published 1987 | Version v1
Miscellaneous

Study of the thermal diffusion of ion-alloyed cesium in aluminium, silicon and titanium by the Rutherford backscattering method

  • 1. Moskovskij Gosudarstvennyj Univ. (USSR). Nauchno-Issledovatel'skij Inst. Yadernoj Fiziki

Description

Thermal diffusion of cesium implanted at 120 keV energy in monocrystal silicon and in polycrystal aluminium and titanium is investigated by the method of Rutherford backscattering (RBS). Parameters of temperature dependence of the cesium diffusion coefficient in materials given above are determined. Cesium is shown to be one of the most movable impurities

Additional details

Additional titles

Original title (Russian)
Исследование термической диффузии ионно-легированного цезия в алюминии, кремнии и титане методом ROR

Publishing Information

Imprint Title
General and nuclear physics
Journal Issue
no. 1(37
Series
Voprosy atomnoj nauki i tekhniki.
Journal Page Range
p. 51-53.
Report number
INIS-SU--37/A

Optional Information

Notes
7 refs.; 2 figs.; 2 tabs. Imprint:Obshchaya i yadernaya fizika.;Nauchno-tekhnicheskij sbornik.