Published May 1984
| Version v1
Journal article
Resonance Raman spectra of porphyrins on gamma-alumina and silica
Creators
- 1. Department of Chemical Engineering, Ames Laboratory-USDOE, Iowa State University, Ames, Iowa, 50011 (G.L.S)
- 2. Center for Catalytic Science and Technology, University of Delaware, Newark, Delaware 19711 (B.J.S.)
Description
Resonance Raman Spectroscopy is used to evaluate trace contaminants of nickel and vanadiuim prophysins on gamma-alumina. Nickel tetraphenyl-porphine compounds were adsorbed on gamma-alumina and silica and Raman spectra were obtained by excitation into the visible porphyrin bands
Additional details
Publishing Information
- Journal Title
- Appl. Spectrosc.
- Journal Volume
- 38
- Journal Issue
- 3
- Series
- Appl. Spectrosc.
- Journal Page Range
- 433-435
- ISSN
- 0003-7028
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 16020279
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ADSORPTION; ALUMINIUM OXIDES; CHEMICAL REACTION KINETICS; LASER SPECTROSCOPY; NICKEL COMPOUNDS; PORPHYRINS; QUANTITATIVE CHEMICAL ANALYSIS; RAMAN SPECTRA; SILICON OXIDES; TRACE AMOUNTS; VANADIUM COMPOUNDS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CARBOXYLIC ACIDS; CHALCOGENIDES; CHEMICAL ANALYSIS; HETEROCYCLIC ACIDS; HETEROCYCLIC COMPOUNDS; KINETICS; ORGANIC ACIDS; ORGANIC COMPOUNDS; ORGANIC NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; REACTION KINETICS; SILICON COMPOUNDS; SPECTRA; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS