Published 2002 | Version v1
Miscellaneous Open

Study of influence of thermal treatment on lifetime of charge carriers in silicon doped by nickel

  • 1. Institute of Nuclear Physics AS RU, Tashkent (Uzbekistan)

Description

no abstract available

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Part of:
Book of abstracts of republic conference of young physicists of Uzbekistan

Additional details

Additional titles

Original title (Russian)
Исследование влияния характера термообработки на время жизни носителей заряда в кремнии, легированном никелем

Publishing Information

Publisher
Oezbekiston Respublikasi Fanlar Akademiyasi Yadro Fizikasi Instituti
Imprint Place
Tashkent (Uzbekistan)
Imprint Title
Book of abstracts of republic conference of young physicists of Uzbekistan
Imprint Pagination
103 p.
Journal Page Range
p. 57-58
Report number
INIS-UZ--125

Conference

Title
Republic conference of young physicists of Uzbekistan
Original Conference Title
Respublikanskaya konferentsiya molodykh fizikov Uzbekistana
Dates
3-4 Dec 2002
Place
Tashkent (Uzbekistan)

INIS

Country of Publication
Uzbekistan
Country of Input or Organization
Uzbekistan
INIS RN
38115495
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference, No Abstract
Descriptors DEI
ANNEALING; DOPED MATERIALS; HALL EFFECT; N-TYPE CONDUCTORS; NICKEL; SCHOTTKY BARRIER DIODES; SILICON; TEMPERATURE RANGE 1000-4000 K; TRACE AMOUNTS
Descriptors DEC
ELEMENTS; HEAT TREATMENTS; MATERIALS; METALS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SEMICONDUCTOR MATERIALS; SEMIMETALS; TEMPERATURE RANGE; TRANSITION ELEMENTS

Optional Information

Notes
Imprint:Sbornik tezisov respublikanskoj konferentsii molodykh fizikov Uzbekistana